Tantalum nitride (TaN) thin films were coated at room temperature (30°C) on carbide turning inserts using DC magnetron sputtering technique. The mechanical properties like adhesion and hardness of these coating have been evaluated by Scratch tester; the thickness is estimated by Ball and Crater method. The properties of the films are studied by X-Ray diffraction (XRD) technique. The Optical Emission Spectroscopy (OES) has been employed to analyze the sputtering plasma to understand the reaction kinetics of tantalum nitride formation. The surface of the substrates: tools, glass and single crystal silicon, has been treated with plasma for better adhesion. A 2 μm thick TaN was deposited on the turning inserts. The coated inserts withstood a load of 20 N. The preliminary results reported are quite encouraging.
Studies on Tantalum Nitride (TaN) Hard Coatings on Turning Tools by DC Magnetron Sputtering Technique
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Aryasomayajula, A, Gupta, MK, & Janarthanaam, SK. "Studies on Tantalum Nitride (TaN) Hard Coatings on Turning Tools by DC Magnetron Sputtering Technique." Proceedings of the ASME 2005 International Mechanical Engineering Congress and Exposition. Tribology. Orlando, Florida, USA. November 5–11, 2005. pp. 101-104. ASME. https://doi.org/10.1115/IMECE2005-80176
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