Recently, plasmonic nanolithography is studied by many researchers (1, 2 and 3). This presented a low-cost and high-throughput approach to maskless nanolithography technique that uses a metallic sharp-ridge nanoaperture with a high strong nanometer-sized optical spot induced by surface plasmon resonance. However, these nanometer-scale spots generated by metallic nanoapertures are formed in only the near-field region, which makes it very difficult to pattern above the photoresist surface at high-speeds.
Enhanced Air-Gap Control for High-Speed Plasmonic Lithography Using Solid Immersion Lens With Sharp-Ridge Nanoaperture
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Hwang, H, Lee, W, Park, N, Yang, H, Park, Y, & Park, K. "Enhanced Air-Gap Control for High-Speed Plasmonic Lithography Using Solid Immersion Lens With Sharp-Ridge Nanoaperture." Proceedings of the ASME 2011 International Mechanical Engineering Congress and Exposition. Volume 1: Advances in Aerospace Technology; Energy Water Nexus; Globalization of Engineering; Posters. Denver, Colorado, USA. November 11–17, 2011. pp. 927-928. ASME. https://doi.org/10.1115/IMECE2011-63336
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