Realistic random roughness of channel surfaces is known to affect the fluid flow behavior in microscale fluidic devices. This has relevance particularly for applications involving non-Newtonian fluids, such as biomedical lab-on-chip devices. In this study, a surface texturing process was developed and integrated into microfluidic channel fabrication. The process combines colloidal masking and Reactive Ion Etching (RIE) for generating random surfaces with desired roughness parameters on the micro/nanoscale. The surface texturing process was shown to be able to tailor the random surface roughness on quartz. A Large range of particle coverage (around 6% to 67%) was achieved using dip coating and drop casting methods using a polystyrene colloidal solution. A relation between the amplitude roughness, autocorrelation length, etch depth and particle coverage of the processed surface was built. Experimental results agreed reasonably well with model predictions. The processed substrate was further incorporated into microchannel fabrication. Final device with designed wall roughness was tested and proved a satisfying sealing performance.

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