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Keywords: nanowire
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Journal Articles
Pee-Yew Lee, Chun-Jen Weng, Hung Ji Huang, Li-Yan Wu, Guo-Hao Lu, Chao-Feng Liu, Cheng-You Chen, Ting-Yu Li, Yung-Sheng Lin
Publisher: ASME
Article Type: Technical Briefs
J. Manuf. Sci. Eng. September 2023, 145(9): 094501.
Paper No: MANU-23-1086
Published Online: May 9, 2023
... the uniformity of outward appearance. At 2 h of etching, the outward appearance uniformity of face-up etching was more homogeneous than that of stirred face-down and face-down patterns, and the Si nanowires (SiNWs) processed through face-up etching were longer (41 μm) than those subjected to stirred face-down...
