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Keywords: chemical mechanical planarization
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Journal Articles
Article Type: Other (Seals, Manufacturing)
J. Tribol. January 2012, 134(1): 012201.
Published Online: February 9, 2012
... of a single level rough surface with gentle slopes. However, for a nonconventional surface with multilevel roughness or high local surface slopes, such as polishing pads used in chemical mechanical planarization (CMP), it has not been verified whether this model is still applicable as expected. Generally...